مشخصات پژوهش

صفحه نخست /Wavelet-fractal approach to ...
عنوان Wavelet-fractal approach to surface characterization of nanocrystalline ITO thin films
نوع پژوهش مقاله چاپ‌شده در مجلات علمی
کلیدواژه‌ها ITO; Thin film; Surface morphology; Wavelet-Fractal
چکیده In this study, indium tin oxide (ITO) thin films were prepared by electron beam deposition method on glass substrates at room temperature (RT). Surface morphology characterization of ITO thin films, before and after annealing at 500 oC, were investigated by analyzing the surface profile of atomic force microscopy (AFM) images using wavelet transform formalism. The wavelet coefficients related to the thin film surface profiles have been calculated, and then roughness exponent (α) of the films has been estimated using the scalegram method. The results reveal that the surface profiles of the films before and after annealing process have self-affine nature.
پژوهشگران داود رئوفی (نفر اول)، زهرا کلالی (نفر دوم)