مشخصات پژوهش

عنوان	Surface characterization and microstructure of ITO thin films at different annealing temperatures
نوع پژوهش	مقاله چاپ‌شده در مجلات علمی
کلیدواژه‌ها	Electron beam evaporation; ITO thin film; Thermal annealing; Fractal analysis; Morphology
چکیده	In this study, the electron beam evaporation method is used to generate an indium tin oxide (ITO) thin film on a glass substrate at room temperature. The surface characteristics of this ITO thin film are then investigated by means of an AFM (atomic force microscopy) method. The influence of postgrowth thermal annealing on the microstructure and surface morphology of ITO thin films are also examined. The results demonstrate that the film annealed at higher annealing temperature (300 8C) has higher surface roughness, which is due to the aggregation of the native grains into larger clusters upon annealing. The fractal analysis reveals that the value of fractal dimension Df falls within the range 2.16–2.20 depending upon the annealing temperatures and is calculated by the height–height correlation function.
پژوهشگران	داود رئوفی (نفر اول)، احمد کیاست پور (نفر دوم)، حمید رضا فلاح (نفر سوم)، امیر سید حسن روضاتیان (نفر چهارم)