The main purpose of this investigation was to assess the effect of post-deposition annealing treatment on the electrochemical behavior of TiN coating developed on AISI 304 stainless steel substrate using cathodic arc evaporation physical vapor deposition (CAE-PVD). Post-annealing treatment at 400ºC was performed on the coated substrate for 1 h. The studied samples were characterized using X-ray diffraction (XRD), scanning electron microscope (SEM), potentiodynamic polarization (PDP), and electrochemical impedance spectroscopy (EIS) tests. The preferred orientation of TiN (111) was verified by XRD patterns.
