|
Title
|
Effects of the Post-Deposition Annealing Treatment on the Electrochemical Behavior of TiN Coatings Deposited by CAE-PVD Method
|
|
Type
|
JournalPaper
|
|
Keywords
|
post-deposition annealing, electrochemical behavior, TiN coating, CAE-PVD, EIS
|
|
Abstract
|
The main purpose of this investigation was to assess the effect of post-deposition annealing treatment on the electrochemical behavior of TiN coating developed on AISI 304 stainless steel substrate using cathodic arc evaporation physical vapor deposition (CAE-PVD). Post-annealing treatment at 400ºC was performed on the coated substrate for 1 h. The studied samples were characterized using X-ray diffraction (XRD), scanning electron microscope (SEM), potentiodynamic polarization (PDP), and electrochemical impedance spectroscopy (EIS) tests. The preferred orientation of TiN (111) was verified by XRD patterns.
|
|
Researchers
|
(First Researcher)
|