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Title
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Surface characteristics for the TieAleN coatings deposited by high power impulse magnetron sputtering technique at the different bias voltages
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Type
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JournalPaper
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Keywords
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Nanostructured TiAlN coatings HIPIMS Bias voltage Tribological properties Mechanical properties
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Abstract
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High power impulse magnetron sputtering (HIPIMS) is the new PVD technique that has been widely used to deposit hard coatings. In this work, titanium-aluminum nitride (TiAlN) coatings were synthesized through using the HIPIMS technique with various bias voltages from 50 to 200 V. The influence of bias voltage on the microstructure, mechanical, and tribological properties of the TiAlN coatings were investigated. The results indicate that the Al content in TiAlN coatings decreased due to the selective resputtering. The preferred orientation altered from (111) to (200) and the peak shifted to lower 2q values which occurred as the bias voltage increased. The coatings with the best mechanical and tribological properties were obtained at the bias voltage of 150 and 100 V respectively. The influence of coating texture, surface roughness, and residual stress on the properties of the coatings was discussed.
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Researchers
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Farzad Mahboubi (Fifth Researcher), Kwang Ho Kim (Fourth Researcher), Amir Abdollah-zadeh (Third Researcher), Tengfei Zhang (Second Researcher), Hassan Elmkhah (First Researcher)
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