Abstract In this report, Tin-doped In2O3 known as indium tin oxide (ITO) thin films with different film thickness have been deposited onto the glass substrates by an electron beam evaporation technique in the presence of oxygen. Subsequently, the as-deposited films were subjected to a postdeposition heat-treatment at 300 ºC for 1 h in air atmosphere. ITO material was used a composition of 90wt% In2O3 and 10wt% SnO2. The structural properties of ITO thin films were investigated. X-Ray diffraction measurements employing CuKα radiation were performed to determine the crystallinity of the ITO films which showed that the ITO films were polycrystalline with a cubic bixbyite structure. In addition, the grain size of the films increased with increasing the film thickness. Atomic force microscopy (AFM) measurements were acquired in ambient air, in constant force mode, and showed that the surface morphology of the prepared ITO films vary significantly with film thickness. The results reveal that the thicker film has higher surface roughness, which is attribute to the combination of small grains and form the bigger grains upon growth time.
