In this research, the electron beam evaporation method is used to generate an indium tin oxide (ITO) thin film on a glass substrate at room temperature. Subsequently, the film was annealed at 200oC, for 1 h in air atmosphere. The surface characteristics of this ITO thin film are then investigated by means of XRD (X-ray diffraction) andAFM (atomic force microscopy) method. XRD results of the film showed crystalline phase after heat treatment and confirming the amorphous nature of films before it. We employed the results of AFM evident for estimating root-mean-square roughness (RMS) and height roughness (Ra).
