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صفحه نخست /Film Thickness Effect on ...
عنوان
Film Thickness Effect on Fractality of Tin-Doped In2O3 Thin Films
نوع پژوهش مقاله چاپ‌شده
کلیدواژه‌ها
atomic force microscopy, electron beam deposition method, indium tin oxide, multifractal analysis, surface roughness, thin film
چکیده
In this paper, based on atomic force microscopy (AFM) data the surface morphology of tin-doped In2O3 (ITO) thin films, prepared by electron beam deposition method on float glass substrates, was systematically investigated using the multifractal analysis. Topographical characterization of the ITO film surfaces was realized by a novel multifractal approach which may be applied for AFM data. Detailed surface characterization of the 3D surface topography was obtained using statistical parameters, according to the ISO 25178-2: 2012. Multifractal analysis of the film surfaces revealed that ITO thin films have a multifractal geometry. The generalized dimension Dq and the singularity spectrum f(α) provided quantitative values that characterize the local scale properties of film surfaces at nanometer scale. Our results showed that the larger spectrum width Δα (Δα = αmax − αmin) of the multifractal spectra f(α) is related to the larger surface roughness.
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