مشخصات پژوهش

صفحه نخست /Multifractal analysis of ITO ...
عنوان
Multifractal analysis of ITO thin films prepared by electron beam deposition method
نوع پژوهش مقاله چاپ‌شده
کلیدواژه‌ها
ITO thin film; Electron beam evaporation; Multifractal analysis; Surface roughness
چکیده
In this work, we developed the multifractality and its formalism to investigate the surface topographies of ITO thin films prepared by electron beam deposition method for various annealing temperatures from their atomic force microscopy (AFM) images. Multifractal analysis shows that the spectrum width, ∆α (∆α = αmax – αmin), of the multifractal spectra, f (α), can be used to characterize the surface roughness of the ITO films quantitatively. Also, it is found that the f (α) shapes of the as-deposited and annealed films remained left hooked (that is ∆f = f (αmin) - f (αmax) > 0), and falls within the range 0.149 – 0.677 depending upon the annealing temperatures.
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